The NMDC occupies the first floor of the Optics building at The University of Alabama in Huntsville. Primary laboratories include a variety of different clean room conditions designed to meet the specific needs of processes performed within. Photolithography and LPVCD processes reside in a class 1000 cleanroom. Plating and dicing, which are often considered dirty processes, are performed in unmonitored environments. Teaching labs, device testing, wet chemistry and thin film deposition operate in a class 10,000 cleanroom. Independent laboratory testing and polishing are performed in a class 100,000 environment. Particle count, temperature, and humidity are monitored routinely.
View the Cleanroom Safety and Training Course
Thin Film Deposition 
Etching 
- STS Multiplex ASE ICP RIE (Fluorine chemistry)
Lithography
- AB-M LS 68 500W contact aligner (Near UV, Mid UV, Deep UV) - Facility Manual
- OAI J500/VIS contact aligner (Near UV)

- Ultratech XLS i-line stepper
- LEO 1550 SEM with e-beam write and EDAX options
- Bransen 1510 ultrasonic cleaner
- Thermolyne 12000 high temperature furnace
- 2 programmable vacuum ovens
Metrology and Test Equipment 
- KLA - Tencor P-10 Profilometer
- Kulicke and Soffa 4123 Wire Bonder
- Micromanipulator 6200 probe station
- Newport Auto-align system
- Agilent Network Impedance Analyzer
Plating and Polishing
- Engis Hyprez 15" Lapping tool
Computing (Academic Use Only) 
- Dual quad core Xeon chipset w/ 32 GB Ram, 750 MB Nvidia graphics card
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